查看“︁四氟化硅”︁的源代码

{{NoteTA
|T=zh-hans:四氟化硅;zh-hk:四氟化矽;zh-tw:四氟化矽;
|1=zh-hans:硅;zh-hk:矽;zh-tw:矽;
}}
{{Chembox
|   Name = 四氟化硅
|   ImageFile = Silicon-tetrafluoride-2D-dimensions.png
| ImageSize = 150px
|   ImageName = 四氟化硅 键线式
|   ImageFile1 = Silicon-tetrafluoride-3D-vdW.png
| ImageSize1 = 150px 
|   ImageName1 = 四氟化硅 空间填充模型
|   IUPACName = Silicon tetrafluoride
|   OtherNames = 氟化硅、四氟化矽
| Section1 = {{Chembox Identifiers
| CASNo = 7783-61-1
| CASNo_Ref = {{cascite|correct|CAS}}
| SMILES  =  FSi(F)(F)F
| RTECS  =  VW2327000
| SMILES2 = F[Si](F)(F)F
| PubChem = 24556
| UNNumber = 1859
}}
| Section2 = {{Chembox Properties
|   Formula = SiF<sub>4</sub>
|   MolarMass = 104.08 
|   Appearance = 无色气体，<br />在潮湿空气中发烟
|   Density = 1.66 g/cm<sup>3</sup><br />（固，-95&nbsp;°C）
|   Solubility = 发生水解
|   MeltingPt = -90&nbsp;°C
|   BoilingPt = 于-86&nbsp;°C升华（1atm）
|   Viscosity = 
  }}
| Section3 = {{Chembox Structure
|   MolShape = [[四面体形分子构型|四面体]]
|   Dipole = 0 [[德拜|D]]
  }}
| Section7 = {{Chembox Hazards
|   ExternalMSDS =
|   MainHazards = 有毒，具腐蚀性
|   RPhrases = {{R14}}, {{R26/27/28}}, {{R31}}, {{R34}}
|   SPhrases = {{S23}}, {{S26}}, {{S36/37/39}}, {{S45}}
|   EUIndex = 未列出
|   NFPA-H = 3
|   NFPA-F = 0
|   NFPA-R = 2
|   NFPA-O = W
  }}
| Section8 = {{Chembox Related
|   OtherCpds = [[四氯化硅]]、[[硅烷]]、<br />[[氟硅酸]]
  }}
}}

'''四氟化硅'''（[[化学式]]：[[硅|Si]][[氟|F]]<sub>4</sub>）是最常见的[[硅]][[氟化物]]。无色气体，遇水发生[[水解]]生成[[氟硅酸]]，在潮湿空气中发烟。沸点仅高于熔点4&nbsp;°C。首先由{{le|约翰·戴维|John Davy (chemist)}}在1812年合成。<ref>{{cite journal en
  | title = An Account of Some Experiments on Different Combinations of Fluoric Acid
  | author = John Davy
  | journal = [[Philosophical Transactions of the Royal Society of London]]
  | year = 1812
  | volume = 102
  | issue =
  | pages = 352–369
  | url = http://links.jstor.org/sici?sici=0261-0523%281812%29102%3C352%3AAAOSEO%3E2.0.CO%3B2-4
  | doi = 10.1098/rstl.1812.0020
}}</ref>

应用于微电子行业和[[有机合成]]中。<ref>Shimizu, M. "Silicon(IV) Fluoride" Encyclopedia of Reagents for Organic Synthesis, 2001 John Wiley & Sons. DOI: 10.1002/047084289X.rs011</ref> 火山爆发时的烟雾中也含有大量的四氟化硅。<ref>{{cite journal en
  | title = High SiF4/HF ratio detected in Satsuma-Iwojima volcano's plume by remote FT-IR observation
  | author = T. Mori, M. Sato, Y. Shimoike, K. Notsu
  | journal = Earth Planets Space
  | year = 2002
  | volume = 54
  | issue = 
  | pages = 249–256
  | url = http://www.terrapub.co.jp/journals/EPS/pdf/2002/5403/54030249.pdf
  | access-date = 2008-12-18
  | archive-date = 2008-03-09
  | archive-url = https://web.archive.org/web/20080309162507/http://www.terrapub.co.jp/journals/EPS/pdf/2002/5403/54030249.pdf
  | dead-url = no
  }}</ref>

== 制备 ==
大量的四氟化硅是工业上生产[[磷肥]]的副产物。[[氟磷灰石]]经[[硫酸]]处理后，会生成大量的[[氢氟酸]]；氢氟酸再与含硅矿石发生反应，生成挥发性的四氟化硅气体。

实验室制法是用[[氟硅酸]]与[[氯化钡]]反应沉淀出氟硅酸钡，<ref>Hoffman, C. J.; Gutowsky, H. S. “Silicon Tetrafluoride” Inorganic Syntheses McGraw-Hill: New York, Volume 4, pages 145-6, 1953.</ref> 再加热[[氟硅酸钡]]至300&nbsp;°C以上，使之分解生成四氟化硅和[[氟化钡]]。同族的[[四氟化锗]]也可通过这个方法制备，但需要更高的分解温度（700&nbsp;°C）。<ref>Hoffman, C. J.; Gutowsky, H. S. "Germanium Tetrafluoride” Inorganic Syntheses McGraw-Hill: New York, Volume 4, pages 147-8, 1953.</ref>
:<math>\mathrm {H_2SiF_6+BaCl_2\rightarrow BaSiF_6\downarrow +2HCl}</math>
:<math>\mathrm {BaSiF_6\rightarrow BaF_2+SiF_4\uparrow}</math>

除此之外，四氟化硅还有很多其他制取方法，包括[[氟硅酸钠]]与硫酸反应，硅与氟单质化合，[[二氧化硅]]与浓氢氟酸或活泼氟化物反应（即毛玻璃的制作和刻画原理），以及赤热的硅与无水氟化氢反应等。将粗品通过灼热的玻璃毛，再在低温用冷[[肼]]收集，便可除去其中的氟化氢、水等杂质。

== 應用 ==
用于[[氟硅酸]]及[[氟化铅]]的制取，也用作[[水泥]]和[[水磨石]]（人造[[大理石]]）的硬化剂，[[有机硅化合物]]的合成材料。<ref>[https://www.chemsrc.com/cas/7783-61-1_442684.html CAS号查询化工产品分类化学试剂硅烷试剂四氟化硅] {{Wayback|url=https://www.chemsrc.com/cas/7783-61-1_442684.html |date=20210104144804 }}化源網，2020年</ref>

== 参见 ==
* 其他[[卤化硅|四卤化硅]]：[[四氯化硅]]、[[四溴化硅]]、[[四碘化硅]]

== 参考资料 ==
{{reflist}}
{{硅化合物}}

{{Authority control}}
[[Category:卤化硅]]
[[Category:氟化物]]
[[Category:硅-氟化合物]]
[[Category:1810年代发现的物质]]